Question
FULL_TIME
5-10

Senior Engineer, Process Development, Diffusion, NTI

12/3/2025

Develop and optimize unit processes to meet yield and quality requirements for advanced NAND part types. Initiate and manage experiments to widen process margins and test manufacturability of next node solutions.

Working Hours

40 hours/week

Company Size

10,001+ employees

Language

English

Visa Sponsorship

No

About The Company
Micron is an industry leader in innovative memory and storage solutions transforming how the world uses information to enrich life for all. With a relentless focus on our customers, technology leadership, and manufacturing and operational excellence, Micron delivers a rich portfolio of high-performance DRAM, NAND and NOR memory and storage products through our Micron® and Crucial® brands. Every day, the innovations that our people create fuel the data economy, enabling advances in artificial intelligence (AI) and compute-intensive applications that unleash opportunities — from the data center to the intelligent edge and across the client and mobile user experience. To learn more about Micron Technology, Inc. (Nasdaq: MU), visit micron.com.
About the Role
Develop and optimize unit processes to meet the yield and quality requirements of advanced NAND part type Participate with Boise TD Films peers on technology choices for the upcoming nodes and able to translate future technology device needs into clear process requirements Initiate and manage experiments to widen process margins as well as to test out manufacturability of next node solutions Design and implement advanced process monitoring and control methodologies. Provide advice and counsel to management on significant technical issues. Bachelor's in Materials Science, Chemical/Microelectronic Engineering, or Physics with minimum 5 years of relevant experience Master's, or PhD in Materials Science, Chemical/Microelectronic Engineering, or Physics with minimum 2 years of relevant experience Strong understanding of: - Flow dynamics, thermodynamics, and physical phenomena in deposition - Precursor depletion effects in 3D structures and mitigation strategies - Interface characterization techniques (e.g., SIMS, XPS, EDX, SEM/TEM) - Integration and structural constraints in film deposition processes - Memory process flows, especially for planar and vertical NAND Proficiency in data analysis tools (e.g., Y3) and Design of Experiments (DoE) Proven collaboration skills with local and global teams Excellent communication skills for both in-person and remote interactions Self-motivated, adaptable, and capable of managing multiple projects in a dynamic environment Willingness to travel and stay at Boise TD for extended periods (2-4 months) to support technology development
Key Skills
Flow DynamicsThermodynamicsPhysical PhenomenaDepositionPrecursor Depletion EffectsMitigation StrategiesInterface Characterization TechniquesIntegration ConstraintsStructural ConstraintsMemory Process FlowsData Analysis ToolsDesign of ExperimentsCollaboration SkillsCommunication SkillsSelf-MotivatedAdaptable
Categories
EngineeringScience & ResearchTechnology
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